Foundry services for photonic devices

Technical service highlights

Our Canadian Photonics Fabrication Centre (CPFC) is a world-class facility offering fabrication services and the pre-commercial production of photonic devices and photonic integrated circuits. CPFC offers a comprehensive suite of fee-based services including design and modelling, epitaxy, fabrication, and test and characterization.

What we offer

With years of industry-based experience and state-of-the-art facilities, our experts have the ability to deliver foundry solutions for early-stage prototyping and small-to-medium volume production runs of III-V compound semiconductor photonic devices, photonic integrated circuits and gallium nitride (GaN) electronics. We have a clear understanding of current technologies and product applications, as well as industry standard, commercial manufacturing processes.


CPFC operates a metal organic chemical vapour deposition (MOCVD) reactor for development and production of gallium arsenide (GaAs) and indium phosphide (InP) -based devices.

Dielectric Deposition

The CPFC employs both plasma-enhanced chemical vapor deposition (PECVD) and spin-on dielectric processes to planarize, passivate, and provide inter-metal isolation capabilities.

Our spin-on dielectrics include both photo patternable and etch patterned materials that demonstrate low shrinkage and excellent mechanical and electrical stability.

Physical Vapour Deposition (PVD)

The CPFC uses e-beam evaporation to deposit contact and interconnect metals. The use of load-locked systems ensures the highest quality metallization capability.


The CPFC has extensive lithography capabilities to allow it to fabricate complex photonic and electronic devices. The use of I-line stepper lithography provides < 400nm resolution and 60nm overlay capabilities. This is complemented by a cassette-loaded multi wafer direct write e-beam system that provides 5nm resolution which can be used in mix-and-match capability with the steppers.

Plasma Etching

The CPFC uses inductively coupled plasma (ICP) and reactive-ion (RIE) etching to fabricate complex photonic and electronic devices. Cassette-to-cassette and batch processing provide the capability to etch dielectric materials and III/V semiconductor materials using both hot and cold etch chemistries.

Back end processing

The CPFC has the capability to thin wafers and to singulate bars using scribe and cleave or dicing. Further processing can also include facet coating including AR or HR coating.

Why work with us

The NRC has the largest concentration of expertise and facilities in photonic devices, photonics materials, and semiconductor device fabrication in Canada. Our researchers are internationally recognized leaders in their fields of expertise, which include silicon photonics, high-performance laser design, and material science.

We have worked with dozens of photonics companies and key industry players. We are the only organization in Canada with a proven ability to support partners in bringing new photonic products from the concept stage, through materials and design development, to early commercialization.

Contact us

Michael Davison
Director, Business Development

Telephone : 613-716-3942
LinkedInMichael Davison